高精度立式双面研磨机供应商宇环数控机床YH2M8432C（15B）主要用途：

该机可用于玻璃、陶瓷、蓝宝石、砷化碳、铁氧体、铌酸锂等材料薄片零件的双面研磨及抛光。

This machine can be used for lapping/polishing double-surface of thin components such as glass,ceramics,sapphire,carbon arsenide,ferrite, lithium niobate.

高精度立式双面研磨机供应商宇环数控机床YH2M8432C（15B）产品技术特点：Technical features:

1.本机托盘、下/上盘、各轴均通过圆锥滚子轴承和深沟球轴承承载，可以保证设备的精度；

2.齿圈升降通过气缸驱动凸轮套来实现；

3.太阳轮通过1.5KW电机带减速机驱动；

4.下抛光盘、内齿圈由一个齿轮减速机直接驱动，无级变频调速，启停平稳、无冲击；

5.上抛光盘单独由一个齿轮减速机直接驱动，无级变频调速，启停平稳、无冲击，能在抛光不同材质的工件时调到理想的抛光速度；

6.控制元器件均采用24V电源，确保操作者和设备的安全。

1.This machine’s each axis of tray,lower plate,upper plate bears weight by TRB(tapered roller bearing) and DGRB(deep groove ball bearing),machine precision can be assured;

2. Gear ring up and down can be realized through cam bushing driven by air cylinder;

3.Sun wheel is driven by 1.5KW motor with reduction gears;

4.Lower polishing plate,and inner gear rings are directly driven by reduction gears, stepless variable frequency for speed-regulating, stable start&stop without impact.

5.Upper polishing plate is directly driven by one reduction gears, stepless variable frequency for speed-regulating,stable start&stop without impact,the ideal polishing speed can be achieved for different material polishing.

6.All control parts adopt 24v power supply, which can assure safety of the operator and equipment.

宇环数控机床YH2M8432C（15B）主要技术参数